STRONG STPD – G Thermal Positive CTP Plate Developer

Advantages:
Odorless,  foam – free,  non – crystalline

Recommended usage conditions:
Development temperature: 22 – 25 °C
Development time: 15 – 35 seconds
Dynamic replenishment amount: 80 – 100 ml/square meter
Static replenishment amount: 40 – 50 ml/30 minutes
Brush rotation speed: 100 – 120 revolutions per minute
Developer core: Replace once a day
Impact resistance: Replace the entire developer every 2500 square meters or every 15 days

Note: The above parameters vary depending on the plate material.
Net content: 20L

Reviews

There are no reviews yet.

Be the first to review “STRONG STPD – G Thermal Positive CTP Plate Developer”

Your email address will not be published. Required fields are marked *